chemical vapour deposition

Thermally activated chemical vapour deposition

化学需氧量（沉淀）热活化化学气相沉积

互联网摘选

Developments of diamond films by plasma chemical vapour deposition are reviewed in the paper.

本文评述了化学气相沉积法制备人造金刚石薄膜的进展情况.

互联网摘选

For the high technical maturity and the high deposition quality, traditional plasma enhanced chemical vapour deposition ( PECVD) technology was wide applied in the large-scale industrial production.

传统等离子体增强化学气相沉积（PECVD）技术，工艺成熟，制备的薄膜质量高，较适合大规模工业化生产。

互联网摘选

The present article introduces a new technique of chemical vapour deposition titanium Carbide.

本文介绍了一种新的化学气相沉积碳化钛方法。

互联网摘选

The structure and the acidic properties of H β zeolite were modified with phosphorus pentoxide added by using chemical vapour deposition method.

采用化学气相沉积法，研究了五氧化二磷对Hβ分子筛酸性和孔结构的改性。

互联网摘选

Using chemical vapour deposition ( CVD) method to decompose alcohol at high-temperature with ze-olite ( synthetic satonite)-based Fe particles as catalyst, aut hors synthesize carbon nanotubes ( CNTs) of thinner walls and opened ends.

利用CVD法高温分解无水乙醇，以分子筛（合成皂石）基体上的Fe颗粒为催化剂，制备出了管壁更薄、端部为开口结构的碳纳米管。

互联网摘选

The vapour generator for chemical vapour deposition plants allows the extraction of vapours.

用于化学汽相沉积器的蒸汽发生器允许蒸汽抽提.

网络文摘精选

Sulfur incorporation in diamond was performed by B-S co-doping method via microwave plasma chemical vapour deposition ( MPCVD) technique on undoped Si as substrates. Dimethyl disulfide and boron oxide were the doping sources, which were diluted in acetone.

利用微波等离子体化学气相沉积（MPCVD）技术，以丙酮为碳源，用二甲基二硫和三氧化二硼作掺杂源，在硅衬底上制备了硼与硫共掺杂的金刚石薄膜。

互联网摘选

Update the processing methods to make SOFC from solid electrolytical film are by chemical vapour deposition, electrophoretic deposition, flow stretching, sputtering, plasma sputter coating, etc.

目前，SOFC用固体电解质薄膜制备方法有电化学气相沉积法、化学气相沉积法、电泳沉积法、溅射法、等离子喷涂法等。

互联网摘选

The diamond films were deposited in a quartz bell jar type microwave plasma chemical vapour deposition ( MW& PCVD) research device.

利用石英钟罩式微波等离子体化学气相沉积（MW－PCVD）实验装置研究了不同沉积气压对金刚石薄膜沉积结果的影响。

互联网摘选

High quality amorphous silicon films fabrication by hot wire chemical vapour deposition technique

用热丝法制备优质稳定非晶硅薄膜的研究

互联网摘选

The continuous SiC fibers coated with B 4 C using chemical vapour deposition ( CVD ) were made.

采用化学气相沉积 ( CVD ) 方法,在连续SiC纤维 表面沉积一层B4C涂层.

互联网摘选